Analytical Sciences

Emission and Sputtering Characteristics of Ne-Ar Mixed Gas Glow Discharge Plasmas

Hyunkook PARK,* Machiko TSUKIJI,* Kazuaki WAGATSUMA,* and SangChun LEE**

*Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Sendai 980-8577, Japan
**Department of Chemistry and Chemical Engineering, Kyungnam University, 449 Wolyong-dong, Masan 631-701, Korea

The emission characteristics of several Cu lines emitted from a Ne-Ar mixed gas glow discharge plasma were investigated. The addition of small amounts of Ar to a Ne plasma increases the sputtering rate of a Cu sample because Ar ions, which work as the impinging ions for cathode sputtering, are predominantly produced through Penning ionization collisions between Ne metastables and Ar atoms. Ar addition also elevates the number density of electrons in the plasma. These changes occurring in the Ne-Ar mixed gas plasma result in enhanced emission intensities of the Cu lines. The Cu II 270.10-nm and the Cu II 224.70-nm lines yield different intensity dependence on the Ar partial pressure added. This phenomenon is because these Cu II lines are excited principally through different charge transfer processes: collisions with Ne ions for the Cu II 270.10-nm line and collisions with Ar ions for the Cu II 224.70-nm line. The shape of sputtered craters in the Ne-Ar glow discharge plasma was measured. The depth resolution was improved when Ar was added to a Ne plasma because the crater bottoms were flatter with larger Ar partial pressures.

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