Abstract − Analytical Sciences, 18(12), 1395 (2002).
Round Robin Test for Depth Profiling of SiO2/Si Multilayer
Isao KOJIMA,*1 Yasushi AZUMA,*1 Junhua XU,*1 Takayuki SAITOU,*2 So YONEKUBO,*3 and Naoko SHIMOSATO*4
*1 Materials Characterization Division, National Metrology Institute of Japan (NMIJ), National Institute of Advanced Industrial Science and Technology (AIST)AIST Tsukuba Central 5, Higashi 1-1, Tsukuba, Ibaraki 305-8565, Japan
*2 Hokkaido Industrial Research Institute, 19-East-11, Kita-ku, Sapporo 060-0819, Japan
*3 Precision Technology Research Institute of Nagano Prefecture, 1-3-1, Osachi-Katamacho, Okaya, Nagano 394-0084, Japan
*4 Industrial Research Institute of Nagano Prefecture, 1-18-1 Wakasato, Nagano 380-0928, Japan
*2 Hokkaido Industrial Research Institute, 19-East-11, Kita-ku, Sapporo 060-0819, Japan
*3 Precision Technology Research Institute of Nagano Prefecture, 1-3-1, Osachi-Katamacho, Okaya, Nagano 394-0084, Japan
*4 Industrial Research Institute of Nagano Prefecture, 1-18-1 Wakasato, Nagano 380-0928, Japan
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